Polycrystalline CVD Diamond
Chemical Vapor Deposition (abbreviated as CVD) is the use of gaseous or vaporous substances in the gas phase or gas-solid interface reaction to generate solid-state deposit process. Under low-pressure conditions, a certain method is used to activate the carbon containing gas, so that the carbon atoms therein are supersaturated on the substrate (seed crystals) to deposit and grow into diamond. The activation of the carbon source gas and the deposition of carbon atoms are accompanied by a series of chemical reactions, so this method of synthesizing diamond is called chemical vapor deposition.
Product Characteristics:
1.No metallic or non-metallic additives
2.High hardness, high wear resistance, easy processing
3.High thermal conductivity, full band transmission of electromagnetic waves
4.Chemical stability against acid and alkali corrosion
5.Customized service
6.Standardized product specifications include Φ50.8*0.3mm, Φ50.8*0.4mm, Φ25.4*0.3mm, Φ25.4*0.4mm, etc. And also can be customized.
Product Properties
| Optical Properties |
| Useful transmission range | Full-band transmission of
electromagnetic wave |
| Refractive index | 2.41@5900A |
| Physical Properties |
| Density | 3.52 g/cm³ |
| Sonic velocity | >16,000 m/s |
| Thermal Properties |
| Thermal conductivity | 800~2000 W/m·k |
| Mechanical Properties |
| Young's modulus | >1,000 GPa |
| Hardness | (Knoop):>8,000 kg/mm² |
| Fracture toughness | 5~7 Mpa |
| Fracture energy | 25 J/M |
| Flexuralstrength | 500~1,000 MPa |
| Compressive strength | 9 GPa |
| Friction coefficient | 0.1 (Relative to steel) |
| Chemical Properties |
| Chemical inertness | Insoluble in all acids and
bases at roomtemperature |
|
|
Polycrystalline CVD Diamond Images
|
